Abstract: We represent AI-designed metasurfaces[1, 2] and three low-cost manufacturing: 1) nanoimprinting with high-refractive-index dielectric particle embedding resin (PER)[2-5], 2) bandgap engineering of hydrogenated amorphous silicon (a-Si:H)[6], and 3) atomic-layer coating on imprinted resin[7]. a-Si[3], TiO2[2, 4], and ZrO2 PERs[5] are used for metasurfaces at infrared (940 nm), visible (532 nm), and ultraviolet (325 and 248 nm), respectively; measured efficiencies reach 47% (940 nm), 91% (532 nm), 72% (325 nm), and 49% (248 nm). PER metasurfaces with an inverse design provide 3D, full-color holography at visible[2]. The bandgap of a-Si:H is engineered to suppress optical losses, realizing metasurface efficiencies of 42% (450 nm), 65% (532 nm), and 75% (635 nm)[6]. We deposit an atomic layer on resin for 12-inch metasurfaces, achieving measured efficiencies of 61% (450 nm), 78% (532 nm), and 65% (635 nm)[7].

Bio: Prof. Rho is a Mu-Eun-Jae (无垠斋) Endowed Chair Professor and Young Distinguished Professor at Pohang University of Science and Technology (POSTECH), Korea, with a double appointment in the Department of Chemical Engineering and the Department of Mechanical Engineering. He received his Ph.D. at the University of California, Berkeley (2013), M.S. at the University of Illinois, Urbana-Champaign (2008) and B.S. at Seoul National University, Korea (2007) all in Mechanical Engineering. Prior joining POSTECH, he conducted postdoctoral research in Materials Sciences Division & Molecular Foundry at Lawrence Berkeley National Laboratory, and also worked as a principal investigator (Ugo Fano Fellow) in Nanoscience and Technology Division & the Center for Nanoscale Materials at Argonne National Laboratory.